Arame Thiam01

Arame Thiam is a R&D Engineer in the Advanced Patterning department at Imec, Belgium. Her work focuses on Logic Beyond CMOS, Quantum Computing and Optical I/O Lithography Process development support since 2015. Prior to that, she has worked for 2 years at CEA-Leti Grenoble, France as a Post-doctorate Researcher on the Massively Parallel Mask-less lithography project of Mapper where she was developing electron beam process for various applications. She has received a PhD in Microelectronics, Nanotechnologies & Telecommunications and a Master in Microelectronics& Nanotechnologies from the University of Sciences and Technologies of Lille1, France. She has spent the last 5 years working in various advanced lithography projects on Immersion and deep-UV lithography. More recently, she has joined development efforts to enable EUV process for advanced CMOS nodes beyond 5nm.