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Dr. Gilles Cunge (LTM-CNRS), 48 years old, is CNRS research director. He received his Ph.D degree in physics from Grenoble University in 1997, working on the development of plasma diagnostics to analyse the plasma-surface interactions in SiO2 etching processes (widely used in microelectronics manufacturing). In 1998, he spent a one year post-doc in the Plasma Research Laboratory at Dublin City University (Ireland) where he studied stochastic electron heating mechanisms in high-density plasmas. In 1999 he returned to Grenoble University where he engaged in teaching. He then joined the Laboratoire des Technologies de la Microélectronique (LTM) created by the CNRS in 1999, receiving tenure in 2000. He became research director in 2012, and was head of the Plasma etching group from 2016 to 2019. At the LTM, he works on the optimization and characterization of plasma processes of new materials integrated in advanced CMOS devices. His current research is dedicated to the development of new plasma etching technologies adapted to the etching of ultrathin layers and nanostructures (pulsed plasmas, smart etch technology, and processes using block copolymer as masks). Today his work is focused on the development of innovative plasma technology to treat 2D materials such as Graphene (cleaning, doping, and patterning). The work at the LTM is carried out in close collaboration between CNRS, CEA-LETI and industrial partners (STMicroelectronics, Applied Materials USA). This allows performing fundamental research on state of the art industrial tools, which is a considerable advantage in applied science. Dr. Cunge was involved in many contract and collaborations both with academic and industrial partners. He was involved in several ANR, European, RMNT, Regional and CATRENE projects. In particular he was coordinator of the NSCGP Chaire of Excellence of the nanoscience foundation (RTRA) dedicated to numerical modeling of plasma/graphene interactions, in collaboration with Berkeley University (USA).
Dr. Cunge holds 5 patents, has authored and co-authored more than 100 papers (h-index = 30) and has contributed to 65 invited talks at international conferences. Finally, he was instructor in plasma etching and plasma physics at CEI-Europe from 2007 to 2016.