Levinson moz

Harry J. Levinson is currently an independent lithography consultant. Dr. Levinson spent most of his career working in the field of lithography, starting at AMD. He also held positions at Sierra Semiconductor and IBM before returning to AMD in 1994. When wafer operations were spun off from AMD he moved to GLOBALFOUNDRIES and worked there until mid-2018. During the course of his career, Dr. Levinson has worked on lithographic technologies from g-line to EUV. Dr. Levinson served for several years as the chairman of the USA Lithography Technology Working Group that participated in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of two books, Lithography Process Control and Principles of Lithography. He holds over 70 US patents. Dr. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. In recognition of his contributions to SPIE, Dr. Levinson received the Society’s 2014 Directors’ Award. He has a BS in engineering from Cornell University and a PhD in physics from the University of Pennsylvania. His PhD thesis, titled Resonances and Collective Effects in Photoemission, addressed certain phenomenon involving the interactions of light and matter. For this work he received the Wayne B. Nottingham Prize in surface science.